REGENERATION METHOD FOR STRIPPING WASTEWATER FOR PHOTORESIST

摘要

The present invention relates to a regeneration method for stripping wastewater for a photoresist, the method comprising a step for having purifying fluid of stripping wastewater for a photoresist come in contact with a regeneration solution which comprises 40-75 wt % of one or more amine compounds, 20-55 wt % of an alkylene glycol compound, and 1-10 wt % of an additive.