STRIPPING COMPOSITION FOR REMOVING PHOTORESIST AND A METHOD, FOR PEELING PHOTORESIST, USING SAME

摘要

The present invention relates to a stripping composition for removing a photoresist and a method, for peeling a photoresist, using same, the stripping composition comprising: one or more amine compounds; an amide-based compound having substituted 1 to 2 of straight or branched alkyl groups, having from 1 to 5 carbon atoms, for nitrogen; a polar organic solvent; a particular triazole-based compound; and a benzimidazole-based compound.