发明名称 |
SUBSTRATE IMPRINTED WITH A PATTERN FOR FORMING ISOLATED DEVICE REGIONS |
摘要 |
An example provides a method for forming an apparatus including a substrate imprinted with a pattern for forming isolated device regions. A method may include imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level, and depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes. The method may include depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions. |
申请公布号 |
US2016056379(A1) |
申请公布日期 |
2016.02.25 |
申请号 |
US201314779278 |
申请日期 |
2013.03.29 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BRUG James A.;ZHAO Lihua;TAUSSIG Carl A. |
分类号 |
H01L51/00;H01L27/32;H01L51/56 |
主分类号 |
H01L51/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for making an electronic device, comprising:
imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level; depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes; and depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions. |
地址 |
Santa Clara CA US |