DEEP TRENCH ISOLATION STRUCTURES AND SYSTEMS AND METHODS INCLUDING THE SAME

摘要

Deep trench isolation structures and systems and methods including the same are disclosed herein. The systems include a semiconductor device. The semiconductor device includes a semiconductor body, a device region, and the deep trench isolation structure. The deep trench isolation structure is configured to electrically isolate the device region from other device regions that extend within the semiconductor body. The deep trench isolation structure includes an isolation trench, a dielectric material that extends within the isolation trench, a first semiconducting region, and a second semiconducting region. The methods include methods of operating an integrated circuit device that includes a plurality of semiconductor devices that include the disclosed deep trench isolation structures.

主权项

1. A semiconductor device, comprising:
a semiconductor body of a first conductivity type, the semiconductor body having a body dopant concentration and a body surface; a device region extending into the semiconductor body from the body surface; and a deep trench isolation structure configured to electrically isolate the device region from other device regions that extend within the semiconductor body, the deep trench isolation structure comprising (i) an isolation trench extending into the semiconductor body from the body surface and extending around the device region, (ii) a dielectric material extending within the isolation trench, (iii) a first semiconducting region of the first conductivity type having a first dopant concentration, wherein the device region separates the first semiconducting region from the body surface, and (iv) a second semiconducting region of the first conductivity type having a second dopant concentration and separating the device region from the first semiconducting region, wherein the first dopant concentration is greater than the body dopant concentration, and further wherein the first dopant concentration is greater than the second dopant concentration.