发明名称 USE OF POLYMERS AS ADDITIVES IN A POLYMER MATRIX
摘要 The present invention relates to the use of polymers of the following formula (I):;wherein: A1i represents un radical alkylene divalent comprising from 2 to 20 carbon atoms;A2i represents a radical alkylene divalent comprising from 2 to 20 carbon atoms;X1i is chosen from the group consisting of: —S—, —CH2— and a bond;Y represents H, a phenyl group or an alkyl group comprising from 1 to 10 carbon atoms;i represents an integer varying from 1 to n;n represents an integer comprised from 2 to 1,000;provided that the total number of carbon atoms of the radicals A2i, X1i et A1i is greater than or equal to 8;as additives in a polymeric matrix chosen from the group consisting of matrices of polyester, poly(vinly chloride), polyurethane, polyamide, poly(alkyl acrylate), poly(alkyl methacrylate), polystyrene and polyolefin,said polymer of formula (I) being different from poly(ricinoleic acid).
申请公布号 US2016053113(A1) 申请公布日期 2016.02.25
申请号 US201414783409 申请日期 2014.04.08
申请人 UNIVERSITÉ DE BORDEAUX ;INSTITUT DES CORPS GRAS ETUDES ET RECHERCHES TECHNIQUES - ITERG ;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S) ;INSTITUT POLYTECHNIQUE DE BORDEAUX 发明人 CRAMAIL Henri;LEBARBE Thomas;GADENNE Benoit;ALFOS Carine
分类号 C08L67/04 主分类号 C08L67/04
代理机构 代理人
主权项 1. A method of improving impact resistance and/or modulating nano-structuration of a polymeric matrix comprising adding a polymer of the following formula (I) to the polymeric matrix: wherein: A1i represents a linear or branched divalent alkylene radical, comprising from 2 to 20 carbon atoms, said radical optionally comprising one or several unsaturations, and being optionally substituted with at least one —OAlk substituent, Alk representing an alkyl group comprising from 1 to 10 carbon atoms;A2i represents a linear or branched divalent alkylene radical comprising from 2 to 20 carbon atoms, said radical optionally comprising one or several unsaturations, and being optionally substituted with at least one —OAlk substituent, Alk representing an alkyl group comprising from 1 to 10 carbon atoms;X1i is selected from the group consisting of: —S—, —CH2— and a bond;Y represents H, a phenyl group or un alkyl group comprising from 1 to 10 carbon atoms;i represents an integer varying from 1 to n;n represents an integer comprised from 2 to 1,000; provided that the total number of carbon atoms of the radicals A2i, X1i and A1i is greater than or equal to 8; as additives in a polymeric matrix selected from the group consisting of matrices of polyester, poly(vinyl chloride), polyurethane, polyamide, poly(alkyl acrylate), poly(alkyl methacrylate), polystyrene and polyolefin, said polymer of formula (I) being different from poly(ricinoleic acid) fitting the following formula: wherein n is as defined earlier; wherein impact resistance and/or nano-structuration of the polymeric matrix is improved.
地址 Bordeaux FR