| 发明名称 |
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
A resist composition has a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator.;wherein R1 in each occurrence independently represents a fluorine atom or a C1 to C6 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site. |
| 申请公布号 |
US2016053032(A1) |
申请公布日期 |
2016.02.25 |
| 申请号 |
US201514835054 |
申请日期 |
2015.08.25 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MASUYAMA Tatsuro;YAMAMOTO Satoshi;ICHIKAWA Koji |
| 分类号 |
C08F120/22;G03F7/16;G03F7/20;G03F7/38;C08F220/18;C07C69/653;C07C233/14;C08F120/54;C08F220/22;G03F7/038;G03F7/32 |
主分类号 |
C08F120/22 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A resist composition comprising
a resin (A1) which comprises a structural unit having an acid-labile group, a resin (A2) which comprises a structural unit having a group represented by formula (Ia), and an acid generator: wherein R1 in each occurrence independently represents a fluorine atom or a C1 to C6 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site. |
| 地址 |
Tokyo JP |
