| 发明名称 |
Method for Producing a Composition for Forming an Organic Film |
| 摘要 |
The present invention provides a method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method including the steps of (1) washing a compound having an aromatic skeleton by an acid, (2) preparing a composition solution containing the washed compound, (3) filtering the prepared composition solution through a filter, and (4) putting the filtered composition solution into a container made of an organic resin. There can be provided a method for producing a composition for forming an organic film that can form an organic film in which defects after dry etching are reduced. |
| 申请公布号 |
US2016056047(A1) |
申请公布日期 |
2016.02.25 |
| 申请号 |
US201514804507 |
申请日期 |
2015.07.21 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KORI Daisuke;OGIHARA Tsutomu;IWABUCHI Motoaki |
| 分类号 |
H01L21/308;C09D161/26;C09D165/00;C09D161/00;G03F7/11;C09D161/12 |
主分类号 |
H01L21/308 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method comprising the steps of:
(1) washing a compound having an aromatic skeleton by an acid; (2) preparing a composition solution containing the washed compound; (3) filtering the prepared composition solution through a filter; and (4) putting the filtered composition solution into a container made of an organic resin. |
| 地址 |
Tokyo JP |
