| 摘要 |
The present invention provides an imprint apparatus which forms a relief pattern by using a mold in an imprint material on a substrate. The purpose of the present invention is to provide an imprint apparatus which is beneficial to evaluate a separation state between a mold and an imprint material. The apparatus comprises: a curing unit configured to cure an imprint material; a moving unit configured to relatively move a mold and a substrate; a detection unit configured to detect a pattern of light reflected by the mold and light reflected by the substrate; and a processing unit configured to obtain information on a separation state of the mold and the imprint material cured on the substrate based on the pattern detected by the detection unit, while separating the mold from the imprint material cured on the substrate by widening an interval between the mold and the substrate using the moving unit. |
