| 发明名称 |
PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS AND CORRESPONDING METHODS |
| 摘要 |
A structure comprising a substrate and a patterned inorganic material on a surface of the substrate, wherein the patterned inorganic material has edges with an average line-width roughness from 1.2 nm to 2.0 nm at a pitch of no more than about 60 nm. |
| 申请公布号 |
EP2988172(A1) |
申请公布日期 |
2016.02.24 |
| 申请号 |
EP20150178638 |
申请日期 |
2011.05.30 |
| 申请人 |
INPRIA CORPORATION |
发明人 |
STOWERS, JASON K.;TELECKY, ALAN J.;KRESZLER, DOUGLAS A.;GRENVILLE, ANDREW |
| 分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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