发明名称 PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING FILM USING THE COMPOSITION
摘要 Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1): Rf1-Rc-X  (1)
申请公布号 EP2847234(A4) 申请公布日期 2016.02.24
申请号 EP20130839386 申请日期 2013.09.11
申请人 CANON KABUSHIKI KAISHA 发明人 ITO, TOSHIKI;MIHARA, CHIEKO;KAWASAKI, YOUJI
分类号 C08F2/48;H01L21/768;H01L23/532;H05K3/10 主分类号 C08F2/48
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