发明名称 |
マイクロエレクトロニクス構造体およびフォトレジスト層のパターニング方法 |
摘要 |
A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film. |
申请公布号 |
JP5870029(B2) |
申请公布日期 |
2016.02.24 |
申请号 |
JP20120525605 |
申请日期 |
2010.08.06 |
申请人 |
インターナショナル・ビジネス・マシーンズ・コーポレーションINTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ゴールドファーブ、ダリオ、エル.;グロッデ、マーティン;フアン、ウー−ソン、エス.;リウ、セン;ビクリツキ、リボル;リー、ワイ−キン |
分类号 |
G03F7/11;C09B67/46;C09D5/32;C09D7/12;C09D201/00;C09D201/02 |
主分类号 |
G03F7/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|