| 摘要 |
A manufacturing method for an array substrate with a fringe field switching (FFS) type thin film transistor (TFT) liquid crystal display (LCD) includes the following steps. A pattern of a source electrode, a drain electrode, a data line and a pixel electrode is formed by patterning a stack of a first transparent conductive film, a first metal film and a doped semiconductor film formed successively on a transparent substrate. A pattern of a doped semiconductor film and a pattern of a semiconductor layer including a TFT channel are formed by patterning a semiconductor film after the semiconductor film is formed. A pattern of contact holes of the data line in the pad area, a gate line, a gate electrode and a common electrode line is formed by patterning a stack of an insulating film and a second metal film formed successively. A pattern of a common electrode is formed by patterning a second transparent conductive film after the second transparent conductive film is formed. |
