SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD

摘要

The present invention relates to a substrate treatment device and a substrate treatment method. The device comprises: a treatment chamber; a substrate holding and rotating mechanism arranged in the treatment chamber; a cup of a ring shape for collecting a treatment liquid discharged from a substrate; a first chemical liquid supply unit for supplying a first chemical liquid to the substrate; a second chemical liquid supply unit for supplying a second chemical liquid, different from the first chemical liquid, to the substrate; a cleaning liquid nozzle with a cleaning liquid discharging hole; a cleaning liquid supply unit for supplying a cleaning liquid to the cleaning liquid nozzle; a rotation treatment control unit which controls the first and second chemical liquid supply units; and a cleaning control unit which controls the cleaning liquid supply unit. Therefore, the device prevents chemical liquids from being incompatible in the substrate holding and rotating mechanism and the cup.