| 摘要 |
The present invention is to reduce the amount of a precipitate when a phosphoric acid aqueous solution is rinsed by the rinse liquid. A substrate processing method comprises: a phosphoric acid processing step of supplying a phosphoric acid aqueous solution, which contains silicon and has a silicon concentration lower than a saturation concentration, to a surface of a substrate; a liquid volume reducing step of reducing a volume of the phosphoric acid aqueous solution on the substrate, after the phosphoric acid processing step; and a rinse replacing step of supplying a rinse liquid whose temperature is lower than the temperature of the phosphoric acid aqueous solution supplied to the front surface of the substrate in the phosphoric acid processing step to the surface of the substrate, at least partially covered with the phosphoric acid aqueous solution, after the liquid volume reducing step. |
