发明名称 |
CLEANING APPARATUS OF POLISHING PAD |
摘要 |
Provided is a cleaning apparatus for a polishing pad, comprising: a rotating part which is installed in a main body and rotates a polishing pad; a high-pressure water injecting part which is installed in the main body and injects high-pressure water to the polishing pad; and a drying part which dries the polishing pad. |
申请公布号 |
KR101597457(B1) |
申请公布日期 |
2016.02.24 |
申请号 |
KR20140129330 |
申请日期 |
2014.09.26 |
申请人 |
HYUNDAI STEEL COMPANY |
发明人 |
CHOI, TAE SUNG;KIM, CHAN WOO |
分类号 |
B24B53/017;H01L21/304 |
主分类号 |
B24B53/017 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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