METHOD FOR MANUFACTURING THIN FILM LAMINATED ELEMENT

摘要

An object of the present invention is to provide a method for producing a thin-film multilayer device, the method allowing the user to position a photomask for etching using a less-damaged alignment mark. A method according to the present invention for producing a thin-film multilayer device includes a second process in which a device section 10 and an alignment mark are formed on a thin-film multilayer body 7 through photolithographic etching and also includes a third process having a step of applying a photosensitive resist to the thin-film multilayer body 7, a step of placing a photomask having an alignment pattern on the photosensitive resist by aligning the alignment pattern with the alignment mark formed in a previous process, a step of exposing and developing the photosensitive resist, and a step of etching the thin-film multilayer body coated with the photosensitive resist to form a device section and an alignment mark on the thin-film multilayer body.