| 摘要 |
The present invention relates to a transparent conductive film of multi-layered thin-film structure having low surface resistance and high phototransmission and, more specifically, to a transparent conductive film coated with multi-layered thin films having improved phototransmission and low surface resistance by improving the bonding force between a substrate and a film layer by plasma ion implantation to the substrate; laminating one to five oxide layers, one metal layer and one to five oxide layers on the substrate; and adjusting the ratio of the thickness of one of the oxide layers to the thickness of the other of the oxide layers to be in a range of 1:1.1 to 1:3.5. An oxide layer or metal layer laminated using a sputtering method has a disadvantage of high resistance and low phototransmission since its structure is not dense. According to the present invention, sintering by irradiating with the white light of a xenon lamp on at least one or more layers of the oxide layers or metal layers in order to increase the structure density, thereby lowering the surface resistance drastically and increasing the phototransmission significantly. Such transparent conductive film is necessarily used in an electronic device, such as a flat display device, solar cell, and transparent touch panel. |
