PHOTOSENSITIVE RESIN COMPOSITION AND ANTIREFLECTION FILM

摘要

Problem To provide: A photosensitive resin compostion which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the photosensivive resin composition is used for an antireflection film; and an antireflection film which has a cured coating film of this photosensitive resin composition. Solution A photosensitive resin composition for an antireflection film that is characterized in that a low refractive index layer contains an acrylate, a colloidal silica, and an organic modified dimethyl polysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether that serve as surface modification agents; and an antireflection film which is obtained by curing the photosensitive resincomposition.