发明名称 APPARATUS FOR SUPPLYING SLURRY AND POLISHING APPARATUS INCLUDING THE SAME
摘要 An apparatus for supplying slurry according to an embodiment includes a nozzle which jets slurry, a slurry supply part which receives the slurry from the nozzle to discharge the slurry through at least one slurry hole; an accommodating part for installing, inserting, mounting, combining, supporting, or arranging the slurry supply part to discharge the slurry from the slurry supply part, and accommodating a fluidal material around the slurry supply part; and a slurry protection part which surrounds the fluidal material and a space where the slurry passes from an outlet of the nozzle to an inlet of the slurry supply part.
申请公布号 KR20160020138(A) 申请公布日期 2016.02.23
申请号 KR20140105105 申请日期 2014.08.13
申请人 LG SILTRON INCORPORATED 发明人 BAE, JAE HYUN;HAN, KEE YUN
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
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