发明名称 APPARATUS FOR MEASURING DEFORMATION OF LINEAR MOTION GUIDE AND STAGE
摘要 Disclosed is an apparatus for measuring deformation of a linear motion guide and a stage. The apparatus for measuring deformation of a linear motion guide uses a plurality of capacitive sensors with respect to a stage driven on a linear motion guide to measure deformation of the linear motion guide, and comprises: one or more capacitive sensors fixed to the outside of the stage to measure a distance to a side of the linear motion guide; and a processor to analyze output signals of the capacitive sensors to determine deformation of the linear motion guide in a Y-axis direction. The Y-axis direction can be a vertical direction to the side with respect to a longitudinal direction of the linear motion guide.
申请公布号 KR20160020084(A) 申请公布日期 2016.02.23
申请号 KR20140104953 申请日期 2014.08.13
申请人 SOONHAN ENGINEERING CORP. 发明人 PARK, YON MOOK;HWANG, HA NA
分类号 G01B7/16;H01L21/677 主分类号 G01B7/16
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