发明名称 |
APPARATUS FOR MEASURING DEFORMATION OF LINEAR MOTION GUIDE AND STAGE |
摘要 |
Disclosed is an apparatus for measuring deformation of a linear motion guide and a stage. The apparatus for measuring deformation of a linear motion guide uses a plurality of capacitive sensors with respect to a stage driven on a linear motion guide to measure deformation of the linear motion guide, and comprises: one or more capacitive sensors fixed to the outside of the stage to measure a distance to a side of the linear motion guide; and a processor to analyze output signals of the capacitive sensors to determine deformation of the linear motion guide in a Y-axis direction. The Y-axis direction can be a vertical direction to the side with respect to a longitudinal direction of the linear motion guide. |
申请公布号 |
KR20160020084(A) |
申请公布日期 |
2016.02.23 |
申请号 |
KR20140104953 |
申请日期 |
2014.08.13 |
申请人 |
SOONHAN ENGINEERING CORP. |
发明人 |
PARK, YON MOOK;HWANG, HA NA |
分类号 |
G01B7/16;H01L21/677 |
主分类号 |
G01B7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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