Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

摘要

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

主权项

1. A lithographic apparatus, comprising:
a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; a substrate temperature conditioning system configured to provide heat transfer to or from at least a portion of the substrate; a temperature sensor configured to determine a temperature; a substrate temperature control system configured to provide a control signal to control the substrate temperature conditioning system based on the determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal and a temperature of the liquid as being supplied to the space by the liquid supply system, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.