发明名称 Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches
摘要 An efficient deposition process is provided for fabricating reliable RF MEMS capacitive switches with multilayer ultrananocrystalline (UNCD) films for more rapid recovery, charging and discharging that is effective for more than a billion cycles of operation. Significantly, the deposition process is compatible for integration with CMOS electronics and thereby can provide monolithically integrated RF MEMS capacitive switches for use with CMOS electronic devices, such as for insertion into phase array antennas for radars and other RF communication systems.
申请公布号 US9269519(B2) 申请公布日期 2016.02.23
申请号 US201514731830 申请日期 2015.06.05
申请人 UChicago Argonne, LLC 发明人 Sumant Anirudha V.;Auciello Orlando H.;Mancini Derrick C.
分类号 H01L29/84;H01H59/00;H01L27/20;H03K17/975 主分类号 H01L29/84
代理机构 Tolpin & Partners, PC 代理人 Tolpin Thomas W.;Tolpin & Partners, PC
主权项 1. A radio frequency (RF) microelectromechanical (MEMS) switch, comprising: a RF MEMS capacitive switch moveable for a switching time from an off position in an off state to an on position in an on state, comprising; a bottom electrode comprising metal providing a RF signal path and having an upwardly facing portion;a top electrode comprising a RF ground and a direct current (DC) ground;a moveable metallic membrane less than 0.4 μm thick, said membrane being spaced from said bottom electrode by an air gap ranging from about 2 microns to about 10 microns resulting in a substantially insignificant capacitance relative to an operating frequency of the switch;a multi-layer dielectric film comprising ultrananocrystalline diamond (UNCD) including: a bottom UNCD layer covering a substantial area of the upwardly facing portion of the bottom electrode;an intermediate UNCD layer on said bottom UNCD layer for providing a high resistivity film, said intermediate UNCD layer having a hydrogen enriched grain boundary for enhanced charge conduction;an upper UNCD layer on the intermediate UNCD layer; andthe dielectric film comprising a substantially continuous UNCD film substantially without pinholes;said membrane contacting said multi-layer dielectric film when a voltage ranging from about 30 volts to about 50 volts is applied across the top and bottom electrodes in the on state; andsaid multi-layer dielectric film discharging and leaking accumulated charges and said RF MEMS capacitive switch recovering within 80 μ sec.
地址 Argonne IL US