Rapid exchange device for lithography reticles

摘要

Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

主权项

1. A system comprising:
a rotary support device having an axis of rotation; a first baseplate support connected to the rotary support device and configured to support a first baseplate, the first baseplate being configured to hold a first reticle; and a second baseplate support connected to the rotary support device and configured to support a second baseplate, the second baseplate being configured to hold a second reticle, a reticle loading and unloading position configured to transfer the first reticle between a reticle storage device and the first baseplate and to transfer the second reticle between the reticle storage device and the second baseplate; and a reticle stage loading position configured to transfer the first reticle between the first baseplate and a reticle stage and to transfer the second reticle between the second baseplate and the reticle stage, the reticle stage loading position being positioned at an angle of substantially 180 degrees about the axis of rotation from the reticle loading and unloading position; wherein the system is configured to rotate the first baseplate and the second baseplate to the reticle loading and unloading position and to the reticle stage loading position, wherein the first and second baseplate supports are configured to position the first baseplate and the second baseplate at substantially equal and fixed distances from the axis of rotation, and the first and second baseplate supports are fixed relative to each other such that the first and second baseplate supports rotate in unison, wherein the first baseplate support is positioned at an angle less than substantially 180 degrees about the axis of rotation from the second baseplate support such that while the first baseplate support is at the reticle loading and unloading position the second baseplate support is at a position between the reticle loading and unloading position and the reticle stage loading position, wherein the system is configured such that, while either the first baseplate support or the second baseplate support is at the reticle loading and unloading position, the reticle stage loading position is unoccupied by any baseplate support connected to the rotary support device and configured to support a baseplate of the system, and wherein the system is configured to transfer the first reticle between the reticle storage device and the first baseplate when the second baseplate support is at the position between the reticle loading and unloading position and the reticle stage loading position.