Controller for optical device, exposure method and apparatus, and method for manufacturing device

摘要

An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

主权项

1. An exposure method for exposing an object with a plurality of pulse lights, the exposure method comprising:
guiding light from a first optical device illuminated by the pulse lights to a second optical device and exposing the object with light from the second optical device; controlling a conversion state of the second optical device that includes a plurality of second optical elements; and controlling a conversion state of the first optical device that includes a plurality of first optical elements to control intensity distribution of the pulse lights on a predetermined plane between the first optical device and the second optical device, wherein the controlling of the conversion state of the first optical device includes changing a state of the first optical elements whenever a predetermined number of pulse lights are emitted.