IMPRINT APPARATUS, ILLUMINATION OPTICAL SYSTEM, AND ARTICLE MANUFACTURING METHOD

摘要

An imprint device comprises a heating unit which is configured to heat an imprint region in a substrate to deform the shape of the imprint region where imprint treatment is performed. The heating unit comprises: a first optical system configured to emit a light beam extending in first and second directions vertical to an optical axis; a changing unit configured to change the ratio of widths of the first and second directions of the light beam emitted from the first optical system; and a strength distribution adjusting unit configured to adjust strength distribution of the light beam of which the ratio is changed. The heating unit irradiates the light beam to the imprint region by the light beam from the strength distribution adjusting unit to heat the imprint region.