发明名称 |
Substrate gripping apparatus |
摘要 |
The present invention relates to a substrate gripping apparatus includes a base, a plurality of support posts which are vertically movable relative to the base, a lifting mechanism configured to lift the support posts, and a substrate holder and a substrate guide member mounted to each of the support posts. Each of the support posts includes a relative movement mechanism configured to move the substrate holder in such a direction that the substrate holder releases a peripheral portion of a substrate, while raising the substrate guide member relative to the substrate holder, when the support post moves upward, and to move the substrate holder in such a direction that the substrate holder grips the peripheral portion of the substrate, while lowering the substrate guide member relative to the substrate holder, when the support post moves downward. |
申请公布号 |
US9269605(B2) |
申请公布日期 |
2016.02.23 |
申请号 |
US201414150257 |
申请日期 |
2014.01.08 |
申请人 |
EBARA CORPORATION |
发明人 |
Miyazaki Mitsuru;Matsuda Naoki;Kunisawa Junji;Hoshina Manao |
分类号 |
H01L21/687 |
主分类号 |
H01L21/687 |
代理机构 |
Pearne & Gordon LLP |
代理人 |
Pearne & Gordon LLP |
主权项 |
1. A substrate gripping apparatus, comprising:
a base; a plurality of support posts which are supported by the base and are vertically movable relative to the base; a lifting mechanism configured to lift the support posts; and a substrate holder and a substrate guide member mounted to each of the support posts, each of the support posts including a relative movement mechanism configured to move the substrate holder and the substrate guide member relative to each other, the relative movement mechanism being configured
to move the substrate holder in such a direction that the substrate holder releases a peripheral portion of a substrate, while raising the substrate guide member relative to the substrate holder, when the support post moves upward, andto move the substrate holder in such a direction that the substrate holder grips the peripheral portion of the substrate, while lowering the substrate guide member relative to the substrate holder, when the support post moves downward. |
地址 |
Tokyo JP |