| 发明名称 | Contaminant measurement substrate, apparatus and method for fabricating substrate using the same | ||
| 摘要 | An apparatus for fabricating a substrate includes a chamber providing a space in which processes are performed, a contaminant measurement substrate including a base material configured to collect contaminants, and laser marks on the base material and defining coordinates of the base material, a first stage disposed inside the chamber, and upon which the contaminant measurement substrate is seated during collection of the contaminants of the chamber, a second stage disposed outside the chamber, and upon which the contaminant measurement substrate is seated during measurement of the contaminants of the chamber collected on the contaminant measurement substrate, and a contaminant measurement light source disposed on an upper portion of the second stage and configured to irradiate the contaminant measurement substrate seated on the second stage with light during the measurement of the contaminants of the chamber collected on the contaminant measurement substrate. | ||
| 申请公布号 | US9267899(B2) | 申请公布日期 | 2016.02.23 |
| 申请号 | US201314099978 | 申请日期 | 2013.12.08 |
| 申请人 | SAMSUNG DISPLAY CO.,LTD | 发明人 | Park Chong Jin |
| 分类号 | H01L51/56;G01N21/88;G01N21/95;G01N21/94;H01L51/00 | 主分类号 | H01L51/56 |
| 代理机构 | Cantor Colburn LLP | 代理人 | Cantor Colburn LLP |
| 主权项 | 1. An apparatus for fabricating a substrate, comprising: a chamber providing a space in which processes are performed; a contaminant measurement substrate including: a base material configured to collect contaminants, andlaser marks on the base material and defining coordinates of the base material;a first stage disposed inside the chamber, and upon which the contaminant measurement substrate is seated during collection of the contaminants of the chamber;a second stage disposed outside the chamber, and upon which the contaminant measurement substrate is seated during measurement of the contaminants of the chamber collected on the contaminant measurement substrate; and a contaminant measurement light source disposed on an upper portion of the second stage and configured to irradiate the contaminant measurement substrate seated on the second stage with light during the measurement of the contaminants of the chamber collected on the contaminant measurement substrate. | ||
| 地址 | KR | ||