Pellicle for lithogrpahy

摘要

There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the pellicle membrane when slackened does not touch the lower ridge of the slight chamfer.

主权项

1. A pellicle for lithography comprising:
(i) a pellicle membrane; and (ii) a pellicle frame, to an upper annular face of which the pellicle membrane is tensely adhered, wherein the angle of a slight-chamfering formed along an inner edge of the upper annular face of the pellicle frame to which the pellicle membrane is adhered is 10 degrees or greater but less than 30 degrees with respect to a vertical surface of the pellicle frame.