MILTI-GRAY SCALE PHOTOMASK AND MANUFACTURING MATHOD THEREOF

摘要

The present invention relates to a multi-gray scale blank mask and a multi-gray scale photomask having a space as much as the size of a light-shielding film adjacent to a semipermeable pattern with respect to critical value accuracy, when forming a semipermeable membrane pattern. The multi-gray scale blank mask and the multi-gray scale photomask which can obtain the same penetration ratio and pattern accuracy can be produced even if a pattern position is not matched, when forming a semipermeable membrane pattern. The multi-gray scale photomask comprises a permeating unit on a transparent base plate, a light-shielding unit, and a plurality of semi light-transmitting units.