发明名称 Focused ion beam apparatus
摘要 A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.
申请公布号 US9269539(B2) 申请公布日期 2016.02.23
申请号 US201514665410 申请日期 2015.03.23
申请人 HITACHI HIGH-TECH SCIENCE CORPORATION 发明人 Asahata Tatsuya;Suzuki Hidekazu;Sato Makoto
分类号 H01J37/00;H01J37/317;H01J37/244;H01J37/22 主分类号 H01J37/00
代理机构 Adams & Wilks 代理人 Adams & Wilks
主权项 1. A focused ion beam apparatus comprising: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation with the focused ion beam and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.
地址 JP