Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching

摘要

A method for providing a textured layer in an optoelectronic device is disclosed. The method includes depositing a template layer on a first layer. The template layer has significant inhomogeneity either in thickness or in composition, or both, including the possibility of forming one or more islands to provide at least one textured surface of the island layer. The method also includes exposing the template layer and the first layer to an etching process to create or alter at least one textured surface. The altered at least one textured surface is operative to cause scattering of light.

主权项

1. A method for providing a textured layer in an optoelectronic device, the method comprising:
epitaxially growing a template layer of islands on a first planar semiconductor layer wherein the template layer has significant inhomogeneity either in thickness; and exposing the template layer and the first planar semiconductor layer to an etching process, to create at least one textured surface in the first planar semiconductor layer using the template layer as an etching mask, and then epitaxially growing a second semiconductor layer over the template layer.