| 摘要 |
The present invention relates to a technology for designing and manufacturing bear can type plasma vapor deposition equipment capable of maintaining sufficient strength even at a high temperature by using a tantalum material and preventing materials from being scattered at a high temperature. As the shape of the present invention is similar to a bear can, thus the present invention is named the bear can type plasma vapor deposition equipment. A vapor outlet and an electrode generating electronic arcs are formed in an end cap of the bear can type plasma vapor deposition equipment. A feeder capable of supplying a deposited powder is formed on the center of the bear can type plasma vapor deposition equipment while a V-shaped roof and a support cavity are formed inside the bear can type plasma vapor deposition equipment. The support cavity reinforces a kind of structures guiding generated vapor. |
