| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and a plasma processing method, capable of quickly stabilizing plasma after switching of steps so as to enable a proper plasma processing.SOLUTION: A controller 16 disclosed herein drives, in a first step, a high frequency generating source 1 at a first energy condition, and drives, in a second step, the high frequency generating source 1 at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from a gas supply system 11 into a processing container 8, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.SELECTED DRAWING: Figure 1 |
