| 发明名称 |
METHOD AND APPARATUS FOR REMOVING RESIDUE LAYER |
| 摘要 |
A method of removing a residue layer formed on a side surface of each of a plurality of convex-shaped structure which stands together on a surface of a substrate or a side surface of a concave-shaped structure formed on the substrate, includes disposing an electrostatic lens between the substrate and a charged particle irradiation mechanism which linearly irradiates a beam of charged particles onto the substrate. The electrostatic lens diverges the beam of charged particles. |
| 申请公布号 |
US2016045942(A1) |
申请公布日期 |
2016.02.18 |
| 申请号 |
US201514828080 |
申请日期 |
2015.08.17 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HARA Kenichi;FUSHIMI Naoshige |
| 分类号 |
B08B6/00 |
主分类号 |
B08B6/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of removing a residue layer formed on a side surface of each of a plurality of convex-shaped structure which stands together on a surface of a substrate or a side surface of a concave-shaped structure formed on the substrate, comprising:
disposing an electrostatic lens between the substrate and a charged particle irradiation mechanism which linearly irradiates a beam of charged particles onto the substrate, wherein the electrostatic lens diverges the beam of charged particles. |
| 地址 |
Tokyo JP |
