发明名称 |
TREATMENT SOLUTION SUPPLY METHOD, TREATMENT SOLUTION SUPPLY APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a treatment solution supply method capable of keeping particle collecting efficiency over a long enough time, a treatment solution supply apparatus, and a recording medium.SOLUTION: A treatment solution supply method according to the present invention is used for supplying a treatment solution to a substrate. The treatment solution supply method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a first reference value.SELECTED DRAWING: Figure 5 |
申请公布号 |
JP2016027616(A) |
申请公布日期 |
2016.02.18 |
申请号 |
JP20150082541 |
申请日期 |
2015.04.14 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
HAYASHI MASAHITO;TSURUTA TOYOHISA;KAJIWARA MASAYUKI |
分类号 |
H01L21/027;G03F7/30;H01L21/304 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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