发明名称 TREATMENT SOLUTION SUPPLY METHOD, TREATMENT SOLUTION SUPPLY APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a treatment solution supply method capable of keeping particle collecting efficiency over a long enough time, a treatment solution supply apparatus, and a recording medium.SOLUTION: A treatment solution supply method according to the present invention is used for supplying a treatment solution to a substrate. The treatment solution supply method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a first reference value.SELECTED DRAWING: Figure 5
申请公布号 JP2016027616(A) 申请公布日期 2016.02.18
申请号 JP20150082541 申请日期 2015.04.14
申请人 TOKYO ELECTRON LTD 发明人 HAYASHI MASAHITO;TSURUTA TOYOHISA;KAJIWARA MASAYUKI
分类号 H01L21/027;G03F7/30;H01L21/304 主分类号 H01L21/027
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