发明名称 SELF-CLEANING SUBSTRATE
摘要 Provided is a self-cleaning substrate system. The system includes a substrate and a cleaner coupled to the substrate, wherein the cleaner includes at least one of an electrode, an ultrasound emitter, or a coronal wind generator. The system includes a circuit configured to determine a characteristic of the substrate. The system further includes a power source. The system includes a controller operatively coupled to the cleaner, the sensor, and the power source. The circuit provides a feedback signal indicative of the detected characteristic to the controller, and wherein the controller is coupled to the cleaner such that the cleaner can be controlled by the controller.
申请公布号 US2016048264(A1) 申请公布日期 2016.02.18
申请号 US201514925581 申请日期 2015.10.28
申请人 Elwha LLC 发明人 Chan Alistair K.;Duncan William D.;Hyde Roderick A.;Kare Jordin T.;Wood, JR. Lowell L.
分类号 G06F3/041;B08B7/02;B08B5/00;B08B6/00 主分类号 G06F3/041
代理机构 代理人
主权项 1. A method of cleaning a substrate with a substrate cleaning system, the substrate cleaning system including a controller, a determination circuit coupled to the controller, and a cleaning mechanism coupled to the controller, the method comprising: receiving operating instructions at the controller, wherein the operating instructions include an indication of a trigger event relating to a characteristic of the substrate; determining the trigger event via the determination circuit; activating the cleaning mechanism with the controller; and cleaning a localized area of the substrate with the cleaning mechanism.
地址 Bellevue WA US