发明名称 |
SELF-CLEANING SUBSTRATE |
摘要 |
Provided is a self-cleaning substrate system. The system includes a substrate and a cleaner coupled to the substrate, wherein the cleaner includes at least one of an electrode, an ultrasound emitter, or a coronal wind generator. The system includes a circuit configured to determine a characteristic of the substrate. The system further includes a power source. The system includes a controller operatively coupled to the cleaner, the sensor, and the power source. The circuit provides a feedback signal indicative of the detected characteristic to the controller, and wherein the controller is coupled to the cleaner such that the cleaner can be controlled by the controller. |
申请公布号 |
US2016048264(A1) |
申请公布日期 |
2016.02.18 |
申请号 |
US201514925581 |
申请日期 |
2015.10.28 |
申请人 |
Elwha LLC |
发明人 |
Chan Alistair K.;Duncan William D.;Hyde Roderick A.;Kare Jordin T.;Wood, JR. Lowell L. |
分类号 |
G06F3/041;B08B7/02;B08B5/00;B08B6/00 |
主分类号 |
G06F3/041 |
代理机构 |
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代理人 |
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主权项 |
1. A method of cleaning a substrate with a substrate cleaning system, the substrate cleaning system including a controller, a determination circuit coupled to the controller, and a cleaning mechanism coupled to the controller, the method comprising:
receiving operating instructions at the controller, wherein the operating instructions include an indication of a trigger event relating to a characteristic of the substrate; determining the trigger event via the determination circuit; activating the cleaning mechanism with the controller; and cleaning a localized area of the substrate with the cleaning mechanism. |
地址 |
Bellevue WA US |