| 发明名称 |
FILM FORMATION METHOD |
| 摘要 |
In a film formation method, a mist of a solution is sprayed onto a substrate to form a film on the substrate. A film formation is then suspended. The substrate is then exposed to plasma. |
| 申请公布号 |
US2016047037(A1) |
申请公布日期 |
2016.02.18 |
| 申请号 |
US201314782229 |
申请日期 |
2013.04.17 |
| 申请人 |
TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION ;KYOTO UNIVERSITY ;KOCHI PREFECTURAL PUBLIC UNIVERSITY CORPORATION |
发明人 |
HIRAMATSU Takahiro;ORITA Hiroyuki;SHIRAHATA Takahiro;FUJITA Shizyo;KAWAHARAMURA Toshiyuki |
| 分类号 |
C23C16/448;C23C16/455;C23C16/50 |
主分类号 |
C23C16/448 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A film formation method comprising the steps of:
(A) spraying a mist of a solution onto a substrate (10) to form a film on said substrate; (B) suspending said step (A); and (C) after said step (B), exposing said substrate to plasma. |
| 地址 |
Chuo-ku, Tokyo JP |
