发明名称 METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT
摘要 A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.
申请公布号 US2016049586(A1) 申请公布日期 2016.02.18
申请号 US201514923497 申请日期 2015.10.27
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 TAKEDA Toshihiko;NISHIMURA Hiroyuki;OBATA Katsunari
分类号 H01L51/00;B05B15/04 主分类号 H01L51/00
代理机构 代理人
主权项 1. A method for producing a vapor deposition mask that is formed by a metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask, and has openings corresponding to a pattern to be produced by vapor deposition arranged in a plurality of rows being stacked on each other, comprising the steps of: preparing a metal plate with a resin layer in which a resin layer is provided on one surface of the metal plate; forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer; and forming a resin mask by forming the openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows in the resin layer by emitting a laser from the metal mask side.
地址 Tokyo JP