| 发明名称 |
PROCESS FOR REDUCING THE LEVEL OF CHLORIDE IN CHLOROSILANE DIRECT PROCESS HYDROLYZED SUBSTRATE |
| 摘要 |
The present invention relates to a process for providing a low-chloride hydrolyzate comprising contacting an acid or base hydrolyzed substrate of a chlorosilane direct process residue with nitric acid to provide a hydrolyzate with a chloride content of less than about 1.8% by weight. The process of present invention is especially useful in cement kilns and smelter operation. |
| 申请公布号 |
WO2016025290(A1) |
申请公布日期 |
2016.02.18 |
| 申请号 |
WO2015US43997 |
申请日期 |
2015.08.06 |
| 申请人 |
MOMENTIVE PERFORMANCE MATERIALS, INC. |
发明人 |
NYE, SUSAN;SCHLITZER, DAVID |
| 分类号 |
C04B5/00;C07F7/08;C07F7/12;C07F7/20;C10B53/00;C10B57/00;C22B7/00 |
主分类号 |
C04B5/00 |
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