发明名称 |
INTEGRATED CIRCUITS AND FABRICATING METHOD THEREOF |
摘要 |
Provided is an integrated circuit including a nano-sheet FET. The integrated circuit includes: multiple first nano-sheet field-effect transistors (FET); and multiple second nano-sheet FETs. A nano-sheet of any one of the first nano-sheet FETs includes not more than 30% of Si, the first nano-sheet FETs define a critical speed path, a nano-sheet of any one of the second nano-sheet FETs includes not more than 30% of Si, the second nano-sheet FETs define a non-critical speed path, and one of the first nano-sheet FETs is faster than one of the second nano-sheet FETs. |
申请公布号 |
KR20160019051(A) |
申请公布日期 |
2016.02.18 |
申请号 |
KR20150085266 |
申请日期 |
2015.06.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
RODDER MARK S.;OBRADOVIC BORNA J.;PALLE DHARMENDAR REDDY;SENGUPTA RWIK;BOWEN ROBERT C. |
分类号 |
H01L29/78;H01L27/02;H01L29/06;H01L29/41 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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