发明名称 INTEGRATED CIRCUITS AND FABRICATING METHOD THEREOF
摘要 Provided is an integrated circuit including a nano-sheet FET. The integrated circuit includes: multiple first nano-sheet field-effect transistors (FET); and multiple second nano-sheet FETs. A nano-sheet of any one of the first nano-sheet FETs includes not more than 30% of Si, the first nano-sheet FETs define a critical speed path, a nano-sheet of any one of the second nano-sheet FETs includes not more than 30% of Si, the second nano-sheet FETs define a non-critical speed path, and one of the first nano-sheet FETs is faster than one of the second nano-sheet FETs.
申请公布号 KR20160019051(A) 申请公布日期 2016.02.18
申请号 KR20150085266 申请日期 2015.06.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 RODDER MARK S.;OBRADOVIC BORNA J.;PALLE DHARMENDAR REDDY;SENGUPTA RWIK;BOWEN ROBERT C.
分类号 H01L29/78;H01L27/02;H01L29/06;H01L29/41 主分类号 H01L29/78
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