PLASMA GENERATING DEVICE, APPARATUS FOR TREATING SUBSTRATE COMPRISING THE SAME, AND METHOD FOR ADJUSTING UNIFORMITY OF SUBSTRATE TREATMENT

摘要

The present invention relates to a plasma generating device, a substrate processing apparatus comprising the same, and a method for adjusting uniformity of substrate processing. According to an embodiment of the present invention, the plasma generating device comprises: a radio frequency (RF) power source for supplying an RF signal; an upper electrode and a lower electrode arranged to face each other by interposing a space where plasma is generated; and a waveguide delivering the RF signal to the upper electrode, arranged on the upper electrode, and having a conductor which can be inserted inside.