| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a tray for a plasma processing apparatus capable of preventing uniformity of plasma processing to a processed substrate from being spoiled and reducing the number of parts to be exchanged when consumed due to the plasma processing and provide the plasma processing apparatus having the same. <P>SOLUTION: A tray 10 for a plasma processing apparatus which is a tray placed on an upper surface of a substrate placement table 27 provided in a reaction vessel 2 in a state that a processed substrate 11 is housed includes: a tray body 101 placed on the upper surface of the substrate placement table 27; an opening 102 provided in the tray body 101 and penetrating the tray body 101 in the thickness direction; and an annular substrate holding member 103 detachably mounted on the opening 102. The substrate holding member 103 includes: an engaging part 106 engaging with the opening 102; and a substrate supporting part 105 supporting an outer peripheral edge of a lower surface of the processed substrate 11 formed on a lower part of an inner peripheral edge of the substrate holding member 103. <P>COPYRIGHT: (C)2013,JPO&INPIT |
