发明名称 |
パターン形成方法 |
摘要 |
A patterning process comprises (a) providing at least one substrate having at least one major surface; (b) providing at least one patterning composition comprising at least one functionalizing molecule that is a perfluoropolyether organosulfur compound; (c) applying the patterning composition to the major surface of the substrate in a manner so as to form at least one functionalized region and at least one unfunctionalized region of the major surface; and (d) etching at least a portion of the unfunctionalized region. |
申请公布号 |
JP5864259(B2) |
申请公布日期 |
2016.02.17 |
申请号 |
JP20110540782 |
申请日期 |
2009.12.02 |
申请人 |
スリーエム イノベイティブ プロパティズ カンパニー |
发明人 |
ツ リジュン;マシュー エイチ.フレイ;スレシュ アイエル |
分类号 |
C23C26/00;C23F1/00;H01L21/027 |
主分类号 |
C23C26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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