发明名称 METHOD AND APPARATUS FOR COOLING SEMICONDUCTOR WAFER
摘要 A heated semiconductor wafer is mounted on a heated holding table. The heated semiconductor wafer is cooled while insulating the semiconductor wafer from the upper part of the holding table. In the cooling process, the semiconductor wafer is cooled while adjusting the temperature of the semiconductor wafer cooled by radiation heat from the holding table, and the speed and a cooling time of lowering the temperature of the semiconductor wafer.
申请公布号 KR20160018403(A) 申请公布日期 2016.02.17
申请号 KR20150110664 申请日期 2015.08.05
申请人 NITTO DENKO CORPORATION 发明人 HASE YUKITOSHI;MORI SHINICHIROU
分类号 H01L21/324;H01L21/66;H01L21/683 主分类号 H01L21/324
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