发明名称 PRESSURE VESSEL FOR SEMICONDUCTOR PROCESS AND MANUFACTURING METHOD FOR THEREOF
摘要 The present invention is to provide a pressure vessel for a semiconductor process, which is filled with high-purity gas for a semiconductor process and is provided with a connector for pipe connection on one side thereof, to maintain gas used in the semiconductor process in a high-purity state and to improve durability of a product. The pressure vessel comprises: a liner which includes a cylindrical cylinder unit having a hollow therein, and a pair of dome units orbitally welded to both end frames of the cylinder unit, respectively, wherein the cylinder unit and the dome units are immersed in an electrolyte while being separated from each other, are connected to both electrodes, and are disposed so that a conductor faces each inner circumferential surface, to perform an electrolytic polishing process on each inner circumferential surface; and a pressure resistance enhancing unit around which carbon fibers impregnated with synthetic resin are wound multiple times to be intersected and overlapped along an outer circumferential surface of the liner, and which is formed by heating and hardening according to a hardening temperature corresponding to the synthetic resin.
申请公布号 KR101594881(B1) 申请公布日期 2016.02.17
申请号 KR20150094031 申请日期 2015.07.01
申请人 TAEKWANGFUJIKIN CO., LTD. 发明人 KIM, YOUNG HO
分类号 H01L21/02;H01L21/48 主分类号 H01L21/02
代理机构 代理人
主权项
地址