| 摘要 |
The present invention relates to a deposition apparatus. According to an aspect of the present invention, a deposition apparatus for depositing evaporation particles on a substrate, comprises: a vacuum chamber which has a deposition space prepared therein, and has the substrate loaded on the top of the deposition space; an evaporation source which is arranged on the bottom of the deposition space facing the substrate, and sprays evaporation particles to the substrate; a sensor unit which is arranged toward the evaporation source to allow the evaporation particles to be incident thereon, and measures a deposition amount of the evaporation particles; and a rotary unit which is coupled to the sensor unit, and rotates to face the top of the deposition space. |
