发明名称 高エネルギーイオンを使用する磁気薄膜のパターン化
摘要 A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film may be subjected to thermal excitation. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
申请公布号 JP5863882(B2) 申请公布日期 2016.02.17
申请号 JP20140114835 申请日期 2014.06.03
申请人 アプライド マテリアルズ インコーポレイテッドAPPLIED MATERIALS,INCORPORATED 发明人 ナラマス, オムカラム;ヴァーハーヴァーベイク, スティーヴン;フォード, マジェード;ヴェンカテサン, マハリンガム;クリシュナ, ネティ エム.
分类号 G11B5/84;G11B5/64 主分类号 G11B5/84
代理机构 代理人
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