| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus which enables drawing a substrate having detects with drawing data including defects in the region of an absorber pattern.SOLUTION: A drawing apparatus 100 includes: a read-out unit 121 which reads out the ID from a substrate formed with an absorber film for EUV light and an optically readable ID; a memory storage unit 109 which stores information on defect positions, information on defect sizes and pattern data for drawing, correlated with the ID; a verification portion 66 which inputs partial pattern data of the region including at least defects, of the pattern data, the information on defect positions and the information on defect sizes, and verifies whether or not the pattern layout is configured so that defects are located in the region where the absorber film is left after patterning; and a drawing portion 150 which draws a pattern on a substrate by using an electron beam, on the basis of the pattern data which the pattern layout is configured so that defects are located in the region where the absorber film is left after patterning. |
