| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique effective for imprint processing with reduced influences of foreign matters such as particles. <P>SOLUTION: An imprint system including an imprint device comprises: a first partition wall dividing a space for housing the imprint device into a first space to which imprint processing is applied, and a second space surrounding the first space; a second partition wall parting the space for housing the imprint device and a third space surrounding the space; a first air supply part and a second air supply part for supplying purified air to the first space and the second space respectively; a first exhaust part and a second exhaust part for exhausting the air from the first space and the second space respectively; a detector detecting a concentration of foreign matters in the first space; and a controller. The controller controls the first air supply part, the second air supply part, the first exhaust part, and the second exhaust part to increase a ratio of the air passing through the first space relative to an amount of the air passing through the second space when the concentration detected by the detector exceeds a reference value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
