发明名称 Underpotential depositon of metal monolayers from ionic liquids
摘要 A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Φs. The non-diffused monolayer deposited on the surface has a second surface work function value Φs that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.
申请公布号 US9260789(B2) 申请公布日期 2016.02.16
申请号 US201213470713 申请日期 2012.05.14
申请人 United Technologies Corporation 发明人 Zhang Weilong;Yu Xiaomei;Chen Lei;Jaworowski Mark R.;Sangiovanni Joseph J.
分类号 C25D5/10;C25D5/00;C25D5/34;C25D5/44;C25D5/48;C25D3/66;C23C28/00;B32B15/01;C23C28/02;C25D3/44;C25D5/18;C25D5/40 主分类号 C25D5/10
代理机构 Kinney & Lange, P.A. 代理人 Kinney & Lange, P.A.
主权项 1. A method for coating a metal article, the method comprising: providing an alloy substrate; engineering a surface of the alloy substrate to be coated to have a surface work function value Φs; forming an ionic liquid deposition solution containing a precursor of a depositing species; depositing a first of a plurality of monolayers via underpotential deposition (UPD) by cathodically reducing the precursor of the depositing species from the ionic liquid deposition solution onto the surface of the alloy substrate, the first of the deposited plurality of monolayers having a depositing work function value Φd that is less negative than the surface work function value Φs; and increasing a deposition voltage in a stepwise fashion to form subsequent ones of the plurality of monolayers.
地址 Hartford CT US